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Just Like Us

Frank Minirth

Just Like Us

Frank Minirth

$36.99

Hardback
In Just like Us, a medical doctor, a minister, and a psychologist evaluate fifteen major biblical figures -- Paul, David, Naomi, Gideon, and Daniel -- and explain how, like them, we too fit into Gods plan. Just Like Us provides us with a meaningful way to bring the lessons of the Bible to life by helping us to identify with key figures of the Bible and apply their experiences to the everyday stresses and challenges of our lives. From these people who lived and worshiped God thousands of years ago we can learn how to live an inspired life today. While the pressures of our lives (telephones, traffic, and threats of nuclear war) are very different from those of ancient times, the life-and-death issues with which these biblical figures grappled are the same as ours.

- Publisher Discover How God Can Use You, Just As He Used the Heroes and Heroines of the Bible Learn lessons you can use in your daily life from biblical giants-- Gideon, Job, Moses, Caleb, Naomi, David, Solomon, Elijah, Hezekiah, Jeremiah, Daniel, John the Baptist, Martha, Peter, and Paul. Their problems, their doubts, their triumphs are so much like ours-- and their stories like ours fit into God s plan. " This is the best series of biographical studies of Bible characters I have seen. The balance of solid biblical truth and sound psychological insight is just right. It s a valuable manual for personal study and improvement as well as a gold mine for teachers and preachers of the Bible." -- Warren W. Wiersbe, author and conference speaker " The Bible is living history focused on ordinary personalities. Though some were anointed by God with beyond the norm supernatural gifts and abilities, their humanness with all its weaknesses remains intact. This boo,helps us focus on these ordinary personalities and the spiritual lessons we can learn; particularly from this humanness that is 24/7 reality for all of us. I recommend it highly." -- Dr. Gene A. Getz, pastor emeritus, Fellowship Bible Church North, and director, Center for Church Renewal, Plano, Texas " If you ve ever felt a disconnect with all those Bible heroes, Just Like Us is for you. The authors turn them into your friends and neighbors. You ll see their fears and foibles are as common as your own and learn how to connect with God s power as they did." -- Dr. Woodrow Kroll, president, Back to the Bible

- Publisher Preface.1. Introduction to Semiconductor Lithography.1.1 Basics of IC Fabrication.1.2 Moore's Law and the Semiconductor Industry.1.3 Lithography Processing.Problems.2. Aerial Image Formation The Basics.2.1 Mathematical Description of Light.2.2 Basic Imaging Theory.2.3 Partial Coherence.2.4 Some Imaging Examples.Problems.3. Aerial Image Formation The Details.3.1 Aberrations.3.2 Pupil Filters and Lens Apodization.3.3 Flare.3.4 Defocus.3.5 Imaging with Scanners Versus Steppers.3.6 Vector Nature of Light.3.7 Immersion Lithography.3.8 Image Quality.Problems.4. Imaging in Resist: Standing Waves and Swing Curves.4.1 Standing Waves.4.2 Swing Curves.4.3 Bottom Antirefl ection Coatings.4.4 Top Antirefl ection Coatings.4.5 Contrast Enhancement Layer.4.6 Impact of the Phase of the Substrate Refl ectance.4.7 Imaging in Resist.4.8 Defi ning Intensity.Problems.5. Conventional Resists: Exposure and Bake Chemistry.5.1 Exposure.5.2 Post-Apply Bake.5.3 Post-exposure Bake Diffusion.5.4 Detailed Bake Temperature Behavior.5.5 Measuring the ABC Parameters.Problems.6. Chemically Amplifi ed Resists: Exposure and Bake Chemistry.6.1 Exposure Reaction.6.2 Chemical Amplifi cation.6.3 Measuring Chemically Amplifi ed Resist Parameters.6.4 Stochastic Modeling of Resist Chemistry.Problems.7. Photoresist Development.7.1 Kinetics of Development.7.2 The Development Contrast.7.3 The Development Path.7.4 Measuring Development Rates.Problems.8. Lithographic Control in Semiconductor Manufacturing.8.1 Defi ning Lithographic Quality.8.2 Critical Dimension Control.8.3 How to Characterize Critical Dimension Variations.8.4 Overlay Control.8.5 The Process Window.8.6 HV Bias.8.7 Mask Error Enhancement Factor (MEEF).8.8 Line-End Shortening.8.9 Critical Shape and Edge Placement Errors.8.10 Pattern Collapse.Problems.9. Gradient-Based Lithographic Optimization: Using the Normalized Image Log-Slope.9.1 Lithography as Information Transfer.9.2 Aerial Image.9.3 Image in Resist.9.4 Exposure.9.5 Post-exposure Bake.9.6 Develop.9.7 Resist Profi le Formation.9.8 Line Edge Roughness.9.9 Summary.Problems.10. Resolution Enhancement Technologies.10.1 Resolution.10.2 Optical Proximity Correction (OPC).10.3 Off-Axis Illumination (OAI).10.4 Phase-Shifting Masks (PSM).10.5 Natural Resolutions.Problems.Appendix A. Glossary of Microlithographic Terms.Appendix B. Curl, Divergence, Gradient, Laplacian.Appendix C. The Dirac Delta Function.Index.

- Publisher

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About "Just Like Us"

In Just like Us, a medical doctor, a minister, and a psychologist evaluate fifteen major biblical figures -- Paul, David, Naomi, Gideon, and Daniel -- and explain how, like them, we too fit into Gods plan. Just Like Us provides us with a meaningful way to bring the lessons of the Bible to life by helping us to identify with key figures of the Bible and apply their experiences to the everyday stresses and challenges of our lives. From these people who lived and worshiped God thousands of years ago we can learn how to live an inspired life today. While the pressures of our lives (telephones, traffic, and threats of nuclear war) are very different from those of ancient times, the life-and-death issues with which these biblical figures grappled are the same as ours.
- Publisher

Discover How God Can Use You, Just As He Used the Heroes and Heroines of the Bible Learn lessons you can use in your daily life from biblical giants-- Gideon, Job, Moses, Caleb, Naomi, David, Solomon, Elijah, Hezekiah, Jeremiah, Daniel, John the Baptist, Martha, Peter, and Paul. Their problems, their doubts, their triumphs are so much like ours-- and their stories like ours fit into God s plan. " This is the best series of biographical studies of Bible characters I have seen. The balance of solid biblical truth and sound psychological insight is just right. It s a valuable manual for personal study and improvement as well as a gold mine for teachers and preachers of the Bible." -- Warren W. Wiersbe, author and conference speaker " The Bible is living history focused on ordinary personalities. Though some were anointed by God with beyond the norm supernatural gifts and abilities, their humanness with all its weaknesses remains intact. This boo,helps us focus on these ordinary personalities and the spiritual lessons we can learn; particularly from this humanness that is 24/7 reality for all of us. I recommend it highly." -- Dr. Gene A. Getz, pastor emeritus, Fellowship Bible Church North, and director, Center for Church Renewal, Plano, Texas " If you ve ever felt a disconnect with all those Bible heroes, Just Like Us is for you. The authors turn them into your friends and neighbors. You ll see their fears and foibles are as common as your own and learn how to connect with God s power as they did." -- Dr. Woodrow Kroll, president, Back to the Bible
- Publisher

Preface.1. Introduction to Semiconductor Lithography.1.1 Basics of IC Fabrication.1.2 Moore's Law and the Semiconductor Industry.1.3 Lithography Processing.Problems.2. Aerial Image Formation The Basics.2.1 Mathematical Description of Light.2.2 Basic Imaging Theory.2.3 Partial Coherence.2.4 Some Imaging Examples.Problems.3. Aerial Image Formation The Details.3.1 Aberrations.3.2 Pupil Filters and Lens Apodization.3.3 Flare.3.4 Defocus.3.5 Imaging with Scanners Versus Steppers.3.6 Vector Nature of Light.3.7 Immersion Lithography.3.8 Image Quality.Problems.4. Imaging in Resist: Standing Waves and Swing Curves.4.1 Standing Waves.4.2 Swing Curves.4.3 Bottom Antirefl ection Coatings.4.4 Top Antirefl ection Coatings.4.5 Contrast Enhancement Layer.4.6 Impact of the Phase of the Substrate Refl ectance.4.7 Imaging in Resist.4.8 Defi ning Intensity.Problems.5. Conventional Resists: Exposure and Bake Chemistry.5.1 Exposure.5.2 Post-Apply Bake.5.3 Post-exposure Bake Diffusion.5.4 Detailed Bake Temperature Behavior.5.5 Measuring the ABC Parameters.Problems.6. Chemically Amplifi ed Resists: Exposure and Bake Chemistry.6.1 Exposure Reaction.6.2 Chemical Amplifi cation.6.3 Measuring Chemically Amplifi ed Resist Parameters.6.4 Stochastic Modeling of Resist Chemistry.Problems.7. Photoresist Development.7.1 Kinetics of Development.7.2 The Development Contrast.7.3 The Development Path.7.4 Measuring Development Rates.Problems.8. Lithographic Control in Semiconductor Manufacturing.8.1 Defi ning Lithographic Quality.8.2 Critical Dimension Control.8.3 How to Characterize Critical Dimension Variations.8.4 Overlay Control.8.5 The Process Window.8.6 HV Bias.8.7 Mask Error Enhancement Factor (MEEF).8.8 Line-End Shortening.8.9 Critical Shape and Edge Placement Errors.8.10 Pattern Collapse.Problems.9. Gradient-Based Lithographic Optimization: Using the Normalized Image Log-Slope.9.1 Lithography as Information Transfer.9.2 Aerial Image.9.3 Image in Resist.9.4 Exposure.9.5 Post-exposure Bake.9.6 Develop.9.7 Resist Profi le Formation.9.8 Line Edge Roughness.9.9 Summary.Problems.10. Resolution Enhancement Technologies.10.1 Resolution.10.2 Optical Proximity Correction (OPC).10.3 Off-Axis Illumination (OAI).10.4 Phase-Shifting Masks (PSM).10.5 Natural Resolutions.Problems.Appendix A. Glossary of Microlithographic Terms.Appendix B. Curl, Divergence, Gradient, Laplacian.Appendix C. The Dirac Delta Function.Index.
- Publisher

Meet the Author

Frank Minirth

Frank Minirth (MD.,Ph.D) is a Christian Psychiatrist and president of the Minirth Clinic in Richardson, Texas, he is one of only 122 doctors in America and Canada certified by the prestigious American Society of Clinic Psychopharmacology. Dr. Minirth has authored or co-authored more than 70 books, many of which have been translated into foreign languages. Best-sellers include Love Hunger, Love Is a Choice,100 Ways to Overcome Depression and the bestselling Happiness Is a Choice and can be heard weekly on both local and national radio.

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Product Details

Product Details
  • Catalogue Code 215249
  • Product Code 0787969044
  • EAN 9780787969042
  • UPC 723812605545
  • Pages 240
  • Department General Books
  • Category Christian Living
  • Sub-Category General
  • Publisher Jossey Bass
  • Publication Date Apr 2004
  • Dimensions 236 x 163 x 22 mm
  • Weight 0.442kg

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